R74 - Simon Scherrer

Rough surface with CrN deposited on the backside of a single-side-polished silicon wafer, which has been subsequently etched with isotropic reactive ion etching. The sample is UV/ozone (Ossila UV Ozone Cleaner) cleaned for 10 min. AFM scans (tapping mode in air) are performed on a Bruker Icon Dimension with a fresh Olympus OMCL-AC160TS cantilever (fres = 300 kHz, kz = 26 N/m, tip radius = 7 nm). Scan sizes range from 1-30 μm in order to resolve the features of the sample. Author: Simon Scherrer单面抛光硅片的背面沉积有氮化铬（CrN），形成粗糙表面，随后对该样品进行了各向同性反应离子刻蚀处理。该样品经紫外臭氧（Ossila紫外臭氧清洗机）清洗10分钟。采用布鲁克Icon Dimension原子力显微镜（Atomic Force Microscope, AFM）开展扫描测试，测试模式为空气中轻敲模式，配套使用全新奥林巴斯OMCL-AC160TS悬臂梁，其固有谐振频率$f_{res}=300$ kHz，法向刚度$k_z=26$ N/m，针尖半径为7 nm。为充分解析样品表面形貌特征，扫描范围设置为1~30 μm。 作者：西蒙·舍雷尔（Simon Scherrer）

搜集汇总

背景与挑战

背景概述

该数据集是一个原子力显微镜（AFM）扫描的粗糙表面形貌数据集，包含4个周期性测量，每个测量由512×512数据点构成，扫描尺寸范围为1-30微米。样本为经过CrN沉积和反应离子刻蚀处理的硅片，使用Bruker Icon Dimension仪器在轻敲模式下采集，适用于表面形貌研究。