Scanning electron microscope measurements of selected sub-pattern feature dimensions on patterned Ti and Si substrates, including grating groove width, ridge width, and pitch (i.e. groove width + ridge width).
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Data = mean ± standard deviation (n = 5). Scanning electron microscope measurements of selected sub-pattern feature dimensions on patterned Ti and Si substrates, including grating groove width, ridge width, and pitch (i.e. groove width + ridge width).
创建时间：
2014-10-30
