Datasets Related to Nanoporous Silicon Dioxide Films for Large Area and Low-Cost Fabrication of Ultra-Low Refractive Index Coatings

Morphological and Chemical Composition Characterization. The composition of the SiO2-Al2O3 films before and after etching were measured using a Thermo Scientific (K-Alpha) X-ray photoelectron spectrometer. SEM images and EDS analyzes for chemical characterization were recorded using Carl Zeiss (GeminiSEM 500) scanning electron microscope.Optical Characterization.The reflectance and transmittance spectra were measured with a universal measurement spectrophotometer Cary 7000 from Agilent Inc. The refractive indices and thicknesses of the nanoporous silicon dioxide films were obtained using spectral analysis, taking into account the reflectance and transmittance curves in the measurement range of 380 nm-780 nm